Nano polishing liquid for sulfuric compound phase changing material chemical mechanical polishing and its use

Nano polishing liquid for sulfuric compound phase changing material chemical mechanical polishing and its use

The present invention relates to nano polishing liquid for chemical and mechanical polishing (CMP) of phase changing sulfuric compound film material GexSbyTe(1-x-y) and its application in preparing nanometer electronic device phase changing storing material. The nano CMP liquid includes oxidant, che...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: KAILIANG,SONG ZHANG
Format: Patent
Sprache:eng
Schlagworte:
ADHESIVES
BASIC ELECTRIC ELEMENTS
CHEMISTRY
DYES
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
POLISHES
POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH
SEMICONDUCTOR DEVICES
SKI WAXES
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Beschreibung
Zusammenfassung:The present invention relates to nano polishing liquid for chemical and mechanical polishing (CMP) of phase changing sulfuric compound film material GexSbyTe(1-x-y) and its application in preparing nanometer electronic device phase changing storing material. The nano CMP liquid includes oxidant, chelating agent, pH regulator, nanometer grinding agent, anticorrosive agent, surfactant, solvent, etc. The nano CMP liquid has less damage, easy cleaning, no corrosion on equipment and no environmental pollution, and is used in CMP of phase changing sulfuric compound film material GexSbyTe(1-x-y).