Semiconductor device and method of manufacturing the same
A semiconductor device manufacturing method comprises the steps of forming a metal film ( 24 ) on an organic interlayer insulating film ( 22 ) formed over a semiconductor substrate to get a metal diffusion preventing metal carbide film ( 23 ) on a boundary between the organic interlayer insulating f...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A semiconductor device manufacturing method comprises the steps of forming a metal film ( 24 ) on an organic interlayer insulating film ( 22 ) formed over a semiconductor substrate to get a metal diffusion preventing metal carbide film ( 23 ) on a boundary between the organic interlayer insulating film ( 22 ) and the metal film ( 24 ), and leaving the metal carbide film ( 23 ) on the organic interlayer insulating film ( 22 ) by removing selectively the metal film ( 24 ) from the metal carbide film ( 23 ). |
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