Lamination and picture composition method utilizing chemical self-assembly process

Disclosed herein is a method for forming a pattern of carbon nanotubes which includes forming a pattern on a surface-treated substrate using a photolithographic process, and laminating carbon nanotubes thereon using a chemical self-assembly process so as to form the carbon nanotubes in a monolayer o...

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Bibliographische Detailangaben
1. Verfasser: CHONG MYUNG-HWANG,PARK CHONG-SIN,CHONG SEONG-OOK,SU SEUNGU,GOO BON-WON
Format: Patent
Sprache:eng
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Zusammenfassung:Disclosed herein is a method for forming a pattern of carbon nanotubes which includes forming a pattern on a surface-treated substrate using a photolithographic process, and laminating carbon nanotubes thereon using a chemical self-assembly process so as to form the carbon nanotubes in a monolayer or multilayer structure. According to the method for forming a pattern of carbon nanotubes, a monolayer or multilayer carbon nanotube pattern can be easily formed on the substrate, e.g., glass, a silicon wafer and a plastic. Accordingly, the method can be applied to form patterned carbon nanotube layers having a high conductivity, and thus will be usefully utilized in the manufacturing processes of energy storages, for example, solar cells and batteries, flat panel displays, transistors, chemical and biological sensors, semiconductor devices and the like.