Composition and making process of electrothermal semiconductor film

The electrothermal film is produced by compounding saturated ethanol solution containing tin tetrachloride, anhydrous ethanal hydrofluoric acid, boric acid, titanium tetrachloride, potassium chloride, nickel tetrachloride and antimony trichloride; deposition on substrate at 700 deg.C; and sintering....

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Bibliographische Detailangaben
Hauptverfasser:	MINGFA LIU, MIN LUO, ZENGXIN WU
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The electrothermal film is produced by compounding saturated ethanol solution containing tin tetrachloride, anhydrous ethanal hydrofluoric acid, boric acid, titanium tetrachloride, potassium chloride, nickel tetrachloride and antimony trichloride; deposition on substrate at 700 deg.C; and sintering. It has high energy converting efficiency, long service life and other advantages, and is suitable from various power source.