Magnetic recording element

A photolithographic process using an X-direction delimiting mask (S 11 ) for aligning respective side faces of a TMR element ( 1 ) and a strap ( 5 ) situated in a negative X side is performed, to shape the TMR element ( 1 ) and the strap ( 5 ) into desired configurations. The X-direction delimiting...

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Bibliographische Detailangaben
1. Verfasser:	MAEJIMA SHINMUTSU,AGANO SHUICHI,NAGAEI TAKASHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER PHYSICS SEMICONDUCTOR DEVICES STATIC STORES
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Beschreibung
Zusammenfassung:	A photolithographic process using an X-direction delimiting mask (S 11 ) for aligning respective side faces of a TMR element ( 1 ) and a strap ( 5 ) situated in a negative X side is performed, to shape the TMR element ( 1 ) and the strap ( 5 ) into desired configurations. The X-direction delimiting mask (S 11 ) includes a straight edge and is disposed such that the straight edge is parallel to a Y direction and crosses both the TMR element ( 1 ) and the strap ( 5 ) in plan view. In use of the X-direction delimiting mask (S 11 ), respective portions of the TMR element ( 1 ) and the strap ( 5 ) situated in a positive X side relative to the straight edge in plan view are covered with the X-direction delimiting mask (S 11 ).