Method for making dual-inlaid contact window

A method for making double inlaid-metal internal connecting line and contact window opening structure on a base is as follows: form first oxide layer and first nitride layer on the base in turn; forma contact window opening by patterning and etching first nitride layer; form second oxide layer and p...

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Hauptverfasser: YOULUN DU, JIJIN LUO
Format: Patent
Sprache:eng
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Zusammenfassung:A method for making double inlaid-metal internal connecting line and contact window opening structure on a base is as follows: form first oxide layer and first nitride layer on the base in turn; forma contact window opening by patterning and etching first nitride layer; form second oxide layer and photoetching gelatin layer on the contact window opening and first nitride layer; then make a ditchopening which has the size different from the contact window opening by pattening and developing; form double inlaying opening by etching second oxide layer with photoetching gelatin layer as mask and by etching first oxide layer with first nitride layer as mask; and finally, remove the photoetching gelatin layer, form gap wall of the oxides and sedimentate the conductive layer.