Vapor collection method and apparatus

A vapor collection method and apparatus capable of capturing vapor compositions without substantial dilution. The method and apparatus utilize a material (12) that has a surface (14) with an adjacent gas phase. A chamber (16) is positioned in close proximity to a surface (14) of the material (12). T...

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Bibliographische Detailangaben
1. Verfasser:	CAPPS JAMES L,JAIN NIRMAL K,BENSON PETER T
Format:	Patent
Sprache:	eng
Schlagworte:	BLASTING DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM HEATING LIGHTING MECHANICAL ENGINEERING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION TRANSPORTING WEAPONS
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Beschreibung
Zusammenfassung:	A vapor collection method and apparatus capable of capturing vapor compositions without substantial dilution. The method and apparatus utilize a material (12) that has a surface (14) with an adjacent gas phase. A chamber (16) is positioned in close proximity to a surface (14) of the material (12). The position of the chamber (16) creates a relatively small gap (H) between the surface of the material (14) and the chamber (16). The adjacent gas phase between the chamber and the surface define a region possessing an amount of mass. At least a portion of the mass is drawn through the region by induced flow. The utilization of a small gap (H) limits the flow of mass that is external to the chamber (16) from being swept through the chamber by induced flow.