Electron beam exposure method and system therefor

A method of leading an electron beam (22) radiated from an electron emitter (14) through openings provided in a stencil mask (18) to a sensitive sample (12) and exposing it includes placing the electron beam under a low field intensity where the electron beam progresses at a slow speed until reachin...

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Bibliographische Detailangaben

1. Verfasser:	HISATSUGU TOKUSHIGE
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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