Read-only code mask and use method thereof

A method for generating read-only code pattern on a photoresist layer includes providing a chip coated with photoresist layer, providing a projection lens above the chip, providing a light source with a certain wavelength for exposing, and providing a read-only code mask between said lens and light...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	QINGYU ZHANG, QIYUAN HONG, YIBIAO WU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A method for generating read-only code pattern on a photoresist layer includes providing a chip coated with photoresist layer, providing a projection lens above the chip, providing a light source with a certain wavelength for exposing, and providing a read-only code mask between said lens and light source.