Semiconductor manufacturing apparatus control system

To reduce a stop time of transportation of wafers which occurs when one stepper handles many kinds of products, before exposure of semiconductor wafers of a first cassette port 7 a is completed, a process recipe for semiconductor wafers of a second cassette port 7 b is obtained from a host computer...

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Bibliographische Detailangaben
1. Verfasser:	IMAI KEIJI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	To reduce a stop time of transportation of wafers which occurs when one stepper handles many kinds of products, before exposure of semiconductor wafers of a first cassette port 7 a is completed, a process recipe for semiconductor wafers of a second cassette port 7 b is obtained from a host computer 2, the progress of the exposure of the semiconductor wafers of the first cassette port 7 a is detected via a sequencer 5, it is determined, based on the obtained process recipe, whether or not the semiconductor wafers of the second cassette port 7 b can be transported to an exposure stage following the last semiconductor wafer of the first cassette port 7 a, and a stepper 1 is caused to perform exposure in accordance with the determination result and the progress detection result.