Photoetching multiplexing device and manufacturing method thereof

The invention belongs to the technical field of semiconductors, and discloses a photoetching multiplexing device and a manufacturing method thereof.The device comprises a horizontal support arranged between a photoetching machine wafer carrying table and an exposure light source and a circular hollow area embedded in the horizontal support; the horizontal support is provided with a sliding rail groove, and the sliding rail groove is formed in the periphery of the circular hollow area. The horizontal support is provided with a circular hollowed-out area, a light shield of a hollowed-out structure is arranged above the circular hollowed-out area, supporting legs of the light shield are movably installed in the sliding rail groove, a plurality of alignment lines are arranged between the outer frame of the horizontal support and the sliding rail groove, and the plurality of alignment lines divide the circumference of the sliding rail groove at equal intervals. According to the photoetching multiplexing device pro