Method for cleaning component manufactured in photolithographic manufacturing process

A method for cleaning a component to which an unreacted resin adheres, in particular a component manufactured by means of a lithographic generative manufacturing process, comprises: a cleaning step in which the component is placed in a cleaning chamber (1) in which the component is in contact with a cleaning medium, whereby the resin falls off from the component, and a cleaning step in which the component is placed in the cleaning chamber (1); and discharging the cleaning medium carrying the dropped resin from the cleaning chamber (1); and a regeneration step in which the loaded cleaning medium is supplied to a distillation unit (4) in which the contaminated cleaning medium is regenerated by distilling the separation resin. At least one inhibitor is added to the cleaning medium, which inhibitor prevents polymerization of the resin during the cleaning step and/or the regeneration step. 一种用于清洁粘附有未反应树脂的部件、特别是利用光刻生成制造工艺制造的部件的方法，包括：清洁步骤，其中将部件放入清洁室(1)中，部件在清洁室中(1)与清洁介质接触，由此使树脂从部件脱落，以及将载有脱落的树脂的清洁介质从清洁室(1)中排出；和再生步骤，其中