Indium cerium oxide target material and preparation method thereof

The invention belongs to the field of target materials, and discloses an indium cerium oxide target material preparation method, which comprises: mixing indium oxide powder, cerium oxide powder, a dispersant and water, carrying out spray granulation to obtain mixed powder A, sintering the mixed powd...

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Bibliographische Detailangaben
Hauptverfasser: WANG QIFENG, LUO SISHI, LI KAIJIE, GU DESHENG, ZHANG XINGYU
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention belongs to the field of target materials, and discloses an indium cerium oxide target material preparation method, which comprises: mixing indium oxide powder, cerium oxide powder, a dispersant and water, carrying out spray granulation to obtain mixed powder A, sintering the mixed powder A, mixing indium hydroxide powder in the sintered mixed powder A, and carrying out compression molding to obtain a target material blank, and sintering the target blank to obtain the cerium indium oxide target. The indium hydroxide powder is selected to replace an organic binder commonly used in the prior art, and black spots are prevented from being generated on the organic binder in the sintering process; in addition, the indium hydroxide powder is dehydrated in the sintering process, and water hinders the sintering densification process at high temperature, so that the low-density target material is obtained. 本发明属于靶材领域,公开了一种氧化铟铈靶材的制备方法,包括如下步骤:混合氧化铟粉末、氧化铈粉末、分散剂和水后喷雾造粒,得到混合粉末A,然后烧结混合粉末A,再于烧结后的混合粉末A中混合氢氧化铟粉末并压制成