High-temperature chemical vapor deposition equipment

The invention is suitable for the technical field of semiconductor production, and provides high-temperature chemical vapor deposition equipment which comprises a vacuum container, a heat insulation part, a reaction container and a heater. Compared with high-temperature chemical vapor deposition equipment in the prior art, the reaction container and the heater can be arranged in the accommodating space on the heat insulation part and pass through the accommodating space. Due to the arrangement of the heat insulation part, the outward transmission of heat is reduced, the stability and uniformity of the temperature environment in the reaction cavity are ensured, and the heat in the reaction cavity can be better accumulated, so that the temperature in the reaction cavity is easier to reach a higher temperature to meet the process requirements of large-size workpiece processing; meanwhile, the reaction container is arranged in the vacuum cavity of the vacuum container, the reaction container is provided with the