Method for rapidly detecting defects in two-dimensional material

The invention discloses a method for rapidly detecting defects in a two-dimensional material, and relates to the technical field of semiconductors, a sample for defect detection is formed, and the sample sequentially comprises a substrate, the two-dimensional material and a modification layer from b...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SHI YUANYUAN, SUN DONGDONG, FANG WUQING, ZHU GUIXU, MIN YUFENG, LU QIUXIA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBEMICROSCOPY [SPM] CALCULATING COMPUTING COUNTING IMAGE DATA PROCESSING OR GENERATION, IN GENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS SCANNING-PROBE TECHNIQUES OR APPARATUS TESTING
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