Compound, method for producing same, leveling agent, coating composition, resist composition, and article

Provided is a compound that can function as a leveling agent that imparts high smoothness and pin unevenness suppression effect to a coating film. Specifically, the compound has polymer blocks of polymerizable monomers at both ends of a silicone chain, and the degree of dispersion (Mw/Mn), which is...

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Bibliographische Detailangaben
Hauptverfasser:	UENO JUNPEI, FUJIWARA RYUTA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR CHEMICAL PAINT OR INK REMOVERS CHEMISTRY CINEMATOGRAPHY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON CORRECTING FLUIDS DYES ELECTROGRAPHY FILLING PASTES HOLOGRAPHY INKS MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS THEREFOR WOODSTAINS
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Beschreibung
Zusammenfassung:	Provided is a compound that can function as a leveling agent that imparts high smoothness and pin unevenness suppression effect to a coating film. Specifically, the compound has polymer blocks of polymerizable monomers at both ends of a silicone chain, and the degree of dispersion (Mw/Mn), which is the ratio of the weight-average molecular weight to the number-average molecular weight, is in the range of 1.0-2.0. 本发明提供一种可作为对涂膜赋予高平滑性与销不均抑制效果的流平剂而起作用的化合物。具体而言，是一种化合物，其在有机硅链的两末端分别具有聚合性单体的聚合物嵌段，且重均分子量与数均分子量的比即分散度(Mw/Mn)为1.0～2.0的范围。