Impedance matcher, impedance matching method and plasma processing system

An impedance matcher, an impedance matching method and a plasma processing system, the impedance matcher comprising: a first detection unit suitable for acquiring a first voltage amplitude and a first current amplitude of an input end of the impedance matcher and a phase difference between a first detection voltage and a first detection current; the second detection unit is suitable for acquiring output end data of the impedance matcher; the control unit is suitable for generating a corresponding impedance adjustment control signal according to the output end data if the load impedance of the plasma chamber is not matched with the output impedance of the radio frequency power supply; and the matching unit is suitable for adjusting the impedance of the matching unit according to the impedance adjustment control signal, so that the load impedance of the plasma chamber is matched with the output impedance of the radio frequency power supply. According to the technical scheme, the impedance matching speed can be