Manufacturing method of multiplexer

The invention belongs to the technical field of filters, and particularly relates to a manufacturing method of a multiplexer. The method comprises the following steps: carrying out IDT coating operation on a substrate; carrying out photoetching and etching operation on the device subjected to IDT film coating; performing IDT photoetching operation on the device to form an IDT pattern; performing IDT etching operation on the device according to the IDT pattern to obtain a manufactured IDT structure; a multiplexer is manufactured and completed based on an IDT structure; according to the method, the problems of overlay precision and contact resistance caused by multiple IDT photoetching and film coating can be avoided, the performance deterioration influence on the device caused by multiple IDT photoetching and film coating is reduced, and the process manufacturing success rate and the device performance are effectively improved. 本发明属于滤波器技术领域，具体涉及一种多工器的制作方法；该方法包括：在衬底上进行IDT镀膜操作；在IDT镀膜后的器件上进行光刻和刻蚀操作；在器件上进行IDT光刻操作，