SUBSTRATE PROCESSING APPARATUS, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROGRAM

Provided is a technique provided with: a first container moving unit capable of moving a container; a second container moving unit which is disposed at a position different from that of the first container moving unit and is capable of moving the container; a plurality of process modules capable of processing the substrate in the container; a substrate transport unit that is disposed between the first container moving unit and the second container moving unit, is configured so as to be capable of communicating with the plurality of process modules, and is capable of transporting the substrate; a substrate transfer robot which is provided on the substrate transfer unit and which is capable of transferring the substrate to the process module; a third container moving unit that is disposed between the first container moving unit and the second container moving unit and is capable of moving the container from the first container moving unit to the second container moving unit; and a control unit. 本发明提供一种技术，其具有：第一