High-symmetry micro-hemispherical resonant structure forming method
The invention relates to a high-symmetry micro-hemisphere resonance structure forming method which comprises the following steps: arranging a sample material sheet at an opening end of a forming cavity of a forming mold, and vacuumizing the forming cavity based on a vacuum unit so as to perform vacu...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to a high-symmetry micro-hemisphere resonance structure forming method which comprises the following steps: arranging a sample material sheet at an opening end of a forming cavity of a forming mold, and vacuumizing the forming cavity based on a vacuum unit so as to perform vacuum adsorption on the sample material sheet; arranging a heat source above the sample material sheet, and adjusting the relative position of the heat source and the sample material sheet; starting a rotating unit to drive the forming mold to rotate, and starting a heat source to heat a forming area of the sample material sheet; in the forming process of the sample material sheet, adjusting the output temperature of a heat source, the rotating speed of a main shaft, the vacuum negative pressure of a forming cavity and the forming time by adopting a preset control scheme so as to complete the forming processing of the sample material sheet; and the rotating unit and the vacuum unit are sequentially closed, and the for |
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