Actinic-ray-sensitive or radiation-sensitive resin composition, actinic-ray-sensitive or radiation-sensitive film, pattern forming method, method for producing electronic device, and compound

The invention provides an actinic-ray-sensitive or radiation-sensitive resin composition and the like which have excellent roughness performance and roughness performance after time. The actinic-ray-sensitive or radiation-sensitive resin composition contains a compound (Q) represented by a specific...

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Bibliographische Detailangaben
Hauptverfasser:	MARUMO KAZUHIRO, MORI TAKAHIRO, KAMIMURA MINORU, HIURA MASAHIRO, FUJIMAKI NISHIKI, GOTO AKIYOSHI, KOJIMA MASASHI, SHIRAKAWA MICHIHIRO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention provides an actinic-ray-sensitive or radiation-sensitive resin composition and the like which have excellent roughness performance and roughness performance after time. The actinic-ray-sensitive or radiation-sensitive resin composition contains a compound (Q) represented by a specific general formula (I-1) and a resin whose polarity increases by decomposition by the action of an acid. 本发明提供一种粗糙度性能及经时后的粗糙度性能均优异的感光化射线性或感放射线性树脂组合物等。感光化射线性或感放射线性树脂组合物含有由特定的通式(I-1)表示的化合物(Q)和通过酸的作用分解而极性增大的树脂。