Actinic-ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device

The invention provides an actinic-ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic-ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device. The actinic-ray-sensitive or radiation-sensitive resin composition according to the present invention is used for forming an actinic-ray-sensitive or radiation-sensitive film having a film thickness of 1 [mu] m or more, and for exposure by actinic rays or radiation having a wavelength of 200-300 nm, an actinic-ray-sensitive or radiation-sensitive film having a thickness of 12 [mu] m, which is formed from the actinic-ray-sensitive or radiation-sensitive resin composition, has a transmittance of 5% or more with respect to light having a wavelength of 248 nm, and uses the actinic-ray-sensitive or radiation-sensitive resin composition. When an actinic-ray-sensitive or radiation-sensitive film having a film thickness of 1 [mu] m or more is exposed with light having a wavelengt