Wafer post-process appearance detection device

The invention discloses a wafer post-process appearance detection device which comprises a feeding bin mechanism used for stacking and placing carrying discs filled with wafers to be detected, a discharging bin mechanism used for stacking and placing carrying discs with detected wafers, and a feedin...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MO WUQIANG, FENG WENCAN, ZHANG HUA
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses a wafer post-process appearance detection device which comprises a feeding bin mechanism used for stacking and placing carrying discs filled with wafers to be detected, a discharging bin mechanism used for stacking and placing carrying discs with detected wafers, and a feeding and moving-out mechanism used for clamping and taking out the carrying discs loaded with the wafers to be detected from the feeding bin mechanism. The feeding transfer mechanism is used for carrying a carrying disc on the feeding transfer positioning mechanism and a to-be-detected wafer loaded on the carrying disc to the detection moving platform mechanism together, and the detection moving platform mechanism is used for driving the carrying disc and the wafer to move in appearance detection. The visual detection mechanism is used for carrying out appearance detection on the wafers on the carrying discs, and the discharging warehousing mechanism is used for pushing the carrying discs loaded with the detected wafe