Substrate processing apparatus, nozzle inspection method, and storage medium

The substrate processing apparatus of the present invention comprises: a liquid nozzle for releasing a processing liquid from a release port to a substrate below; an image capturing unit that captures an image of the entire periphery of the vicinity of the discharge port of the liquid nozzle; and a control unit that performs: image acquisition control that acquires an inspection image of the entire circumference in the vicinity of the discharge port of the liquid nozzle captured by the image capturing unit; and an evaluation control that evaluates the adhesion state of the attachments to the release port of the liquid nozzle on the basis of the inspection image of the entire circumference in the vicinity of the release port of the liquid nozzle. 本发明的基片处理装置包括：从释放口对下方的基片释放处理液的液喷嘴；对液喷嘴的释放口的附近的全周进行拍摄的拍摄部；和控制部，控制部执行：图像获取控制，其获取在拍摄部中拍摄到的液喷嘴的释放口附近的全周的检查图像；和评价控制，其根据液喷嘴的释放口附近的全周的检查图像，进行附着物在液喷嘴的释放口的附着状态的评价。