Film thickness and component monitoring device and method

The invention provides a film layer thickness and component monitoring device and method. The device comprises a vacuum cavity, a diamond matrix to be coated, a film material disc, a detection array, a laser emission module and an analysis module. The coating monitoring device provided by the invent...

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Hauptverfasser: PENG QINJUN, SHEN YU, BO YONG, ZHOU SIBO, WEN YA
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Sprache:chi ; eng
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creator PENG QINJUN
SHEN YU
BO YONG
ZHOU SIBO
WEN YA
description The invention provides a film layer thickness and component monitoring device and method. The device comprises a vacuum cavity, a diamond matrix to be coated, a film material disc, a detection array, a laser emission module and an analysis module. The coating monitoring device provided by the invention can accurately monitor the thickness and components of the pre-laid film layer in real time, overcomes the problem that the components and the thickness of the film layer cannot be monitored in real time in the process of coating a middle film layer silicon carbide layer/film layer on diamond, and provides a principle of obtaining THz waves based on a diamond Raman effect; by measuring the strength, the waveform and the propagation speed of the THz wave radiated by the diamond, the thickness and the components of the silicon carbide layer/film layer evaporated on the diamond substrate are detected, the thickness and the components of the film layer of the diamond coating are detected, and uneven coating and was
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subjects INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
PHYSICS
TESTING
title Film thickness and component monitoring device and method
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