SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

The substrate processing apparatus includes a processing container, a fluid supply unit, a heating mechanism, a temperature measurement unit, and a control unit. The substrate processing apparatus dries a substrate having a liquid film using a supercritical fluid. The control unit acquires temperature information of the inside of the processing container measured by the temperature measurement unit during a period from the time when the substrate is fed into the processing container to the time when the substrate is fed out, and stores temperature-time data in which the temperature information is associated with time. Furthermore, the control unit extracts the temperature during the period to be subjected to temperature adjustment from the stored temperature time data, determines whether or not it is necessary to correct the set temperature of the heating mechanism on the basis of a comparison between the temperature during the period to be subjected to temperature adjustment and a reference temperature held