Plasma window-based in-situ ion implantation modification method and system applied to hard and brittle material processing

The invention discloses a plasma window-based in-situ ion implantation modification method and system applied to hard and brittle material processing, and belongs to the technical field of ultra-precision processing. Comprising an ion acceleration unit used for generating and controlling ion beams moving in parallel, a plasma window unit used for outputting the ion beams to the atmospheric environment after the ion beams pass through constrained plasmas, and an electrostatic lens unit used for achieving ion beam focusing. The device can realize ion transmission in the atmospheric environment, and is suitable for ion implantation modification, polishing modification and other functions in the atmospheric environment. A high-vacuum environment is avoided, the equipment and the operation process are greatly simplified, and the cost is reduced. Moreover, ion implantation modification in the atmospheric environment is generally more convenient and faster, a complex vacuum system is not needed, and the time for sta