Dust treatment device for semiconductor material preparation and treatment method thereof

The invention relates to the technical field of semiconductor material preparation, and discloses a dust treatment device for semiconductor material preparation and a treatment method thereof.The dust treatment device comprises a conveying device and two sets of connecting supporting legs, the two sets of connecting supporting legs are fixedly connected to the left side and the right side of the conveying device correspondingly, and a connecting plate is fixedly connected to the tops of the two sets of connecting supporting legs; two strip-shaped groove frames are fixedly connected to the bottom of the connecting plate, and the limiting mechanism is arranged at the bottom of the connecting plate. According to the invention, wafers can be continuously driven to be transmitted, the tilted semiconductor wafers are prevented from being clamped on the inner walls of the dust collection ports in the transmission process, and the influence of the dust collection device on the top dust collection of the semiconductor