SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

The present invention is provided with: a processing chamber having a processing space for processing a substrate; a supporting part which supports the substrate in a horizontal posture and is accommodated in the processing space; a fluid supply unit that supplies a processing fluid to the processin...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SHIRAKAWA HAJIME, ANDO KOJI, SUMI NORITAKE, INABA MASAKI, MOTONO TOMOHIRO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HEATING LIGHTING MECHANICAL ENGINEERING SEMICONDUCTOR DEVICES WEAPONS
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