Image sensor test structure and image sensor structure

The invention provides an image sensor testing structure and an image sensor structure.The image sensor testing structure comprises a substrate and a shielding layer, the substrate comprises a first surface, a second surface and at least one photosensitive testing pixel, the first surface and the se...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: PAN DONG, GUAN FUSHENG, LIU HENG
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention provides an image sensor testing structure and an image sensor structure.The image sensor testing structure comprises a substrate and a shielding layer, the substrate comprises a first surface, a second surface and at least one photosensitive testing pixel, the first surface and the second surface are opposite, and the photosensitive testing pixel is located between the first surface and the second surface. The first surface is used as a light incident surface; and the shielding layer covers the first surface so as to prevent an external light signal from entering the photosensitive test pixel, so that the photosensitive test pixel is utilized to execute a dark field test. The number of the white pixels in the image sensor is tested in the manufacturing stage, so that the manufacturing of the image sensor is adjusted in advance, the test cycle period is shortened, the efficiency is improved, the abnormal loss is reduced, and the performance and quality of the image sensor are improved. 本申请提供了一种图