In-situ real-time sensing and compensation of non-uniformities in substrate processing systems

Systems and methods of the present disclosure sense in situ and compensate for various non-uniformities in a substrate processing system in real time. Plasma non-uniformities are sensed by determining a temperature profile over a matrix of a plurality of microheaters disposed in a substrate support. Alternatively, plasma non-uniformities are sensed by determining heat flux through the substrate support using a matrix heater and one or more heaters for heating one or more regions of the substrate support. Plasma non-uniformities are compensated by adjusting one or more parameters, such as power provided to a matrix heater, radio frequency power provided to generate the plasma, chemical properties and/or flow rates of one or more gases used to generate the plasma, settings of a thermal control unit or chiller, and the like. Further, non-uniformities inherent in the substrate support are sensed using regions and matrix heaters, and compensated for by adjusting one or more parameters. 本公开的系统和方法对衬底处理系统中的各种非均匀性进行原位