Three-dimensional reconstruction equipment and method based on photometric stereo method under microscope
The invention discloses three-dimensional reconstruction equipment and method based on a photometric stereo method under a microscope, is used for reconstructing a three-dimensional structure of a microscopic object, is particularly suitable for detecting whether scratches and manufacturing defects...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses three-dimensional reconstruction equipment and method based on a photometric stereo method under a microscope, is used for reconstructing a three-dimensional structure of a microscopic object, is particularly suitable for detecting whether scratches and manufacturing defects exist on the surface of a chip or not, belongs to the technical field of three-dimensional reconstruction, and particularly relates to the technical field of photometric stereo application methods. In order to solve the problem of lack of chip three-dimensional detection equipment convenient to operate at present, a metallographic microscope is transformed, so that three-dimensional reconstruction is carried out on the structure of a chip by using a photometric stereo method. The core idea of the method is that a three-dimensional structure is obtained by transforming a light source of a metallographic microscope, collecting 3-9 chip appearance images under different illumination conditions, performing normal graph |
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