Concentration control device, raw material gasification system, concentration control method, and storage medium storing concentration control program
The invention provides a concentration control device, a raw material gasification system, a concentration control method, and a storage medium storing a concentration control program. A concentration control device (10) for use in a raw material gasification system (100) that introduces a carrier g...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention provides a concentration control device, a raw material gasification system, a concentration control method, and a storage medium storing a concentration control program. A concentration control device (10) for use in a raw material gasification system (100) that introduces a carrier gas into a liquid or solid raw material housed in a gasification container (2), gasifies the raw material, and supplies a raw material gas generated thereby, the concentration control device (10) being capable of rapidly controlling concentration with suppressed overshoot, the concentration control device (10) being provided with: a flow rate control means (5) that controls the flow rate of the carrier gas; a concentration measurement unit (6) that measures the concentration of the starting material gas; and a flow rate control unit (11) for controlling the flow rate operation amount input to the flow rate control device (5) by model predictive control on the basis of the target concentration value of the raw materi |
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