Semiconductor device and preparation method thereof, and electronic equipment
The invention discloses a semiconductor device and a preparation method thereof, and electronic equipment, the semiconductor device comprises a semiconductor substrate, a first isolation layer and an ion implantation layer, the semiconductor substrate comprises a source region, a drain region and a...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!