Separation and detection method for impurity ions in chlorosilane solution

The invention relates to the technical field of polycrystalline silicon production, in particular to a method for separating and detecting impurity ions in a chlorosilane solution, which comprises the following steps: S1, adding water and the chlorosilane solution into a reaction container for reaction; s2, after the reaction is completed, adding ultrapure water until the solid precipitate is submerged; s3, hydrofluoric acid is added for a reaction until precipitates disappear, and an ionic solution is formed; s4, filtering the ionic solution through a cellulose membrane to adsorb impurities; s5, putting the cellulose membrane into a reaction container, and adding concentrated nitric acid and ultrapure water; s6, heating the solution in the reaction container so as to digest the cellulose membrane; s7, fixing the volume of the obtained solution with ultrapure water; and S8, detecting the solution with the constant volume. By adopting the method, sample pollution and impurity loss in the sample pretreatment pr