Positioning and cleaning device for tungsten filament electroplating production
The invention discloses a positioning cleaning device for tungsten filament electroplating production, and belongs to the technical field of tungsten filament cleaning, the positioning cleaning device comprises a washing tank and a positioning scrubbing structure, the washing tank comprises a washin...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a positioning cleaning device for tungsten filament electroplating production, and belongs to the technical field of tungsten filament cleaning, the positioning cleaning device comprises a washing tank and a positioning scrubbing structure, the washing tank comprises a washing tank body, a water outlet, a partition plate and a water inlet, the partition plate divides the washing tank body into a water inlet tank and a water outlet tank, the water inlet is arranged in the water inlet tank, and the water outlet is arranged in the water outlet tank; at least one groove is formed in the partition plate, and the positioning scrubbing structure is arranged in the groove; the positioning scrubbing structure is provided with a mounting buckle and a scrubbing layer mounted on the mounting buckle, the mounting buckle is mounted in the groove, and when water in the water inlet groove flows into the water outlet groove through the groove, the tungsten wire penetrates through the scrubbing layer fo |
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