Substrate exhaust hole layout supplementing method, model training method, device and equipment
The embodiment of the invention discloses a substrate exhaust hole layout supplementing method, a model training method, a device and equipment, and the method comprises the steps: obtaining an exhaust hole graph corresponding to a current metal layer graph, a residual substrate copper sheet graph,...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The embodiment of the invention discloses a substrate exhaust hole layout supplementing method, a model training method, a device and equipment, and the method comprises the steps: obtaining an exhaust hole graph corresponding to a current metal layer graph, a residual substrate copper sheet graph, and substrate copper sheet graphs corresponding to a previous metal layer graph and a next metal layer graph in a sampling substrate drawing; generating a first target metal layer pattern according to the substrate copper sheet patterns corresponding to the previous metal layer pattern and the next metal layer pattern and the residual substrate copper sheet pattern corresponding to the current metal layer pattern; generating a second target metal layer pattern according to the exhaust hole pattern corresponding to the current metal layer pattern; respectively obtaining sample input data and sample target data according to the first target metal layer graph and the second target metal layer graph; and performing con |
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