Method for preparing two-dimensional material based on solution coating and chemical vapor deposition

The invention discloses a method for preparing a two-dimensional material based on solution coating and chemical vapor deposition, and relates to the technical field of semiconductor material preparation, a viscous low-melting-point high-molecular organic polymer is adopted as an adhesive, the adhesive and a metal source inorganic salt required in the two-dimensional material are added into deionized water, and the two-dimensional material is prepared by a sol-gel method. The preparation method comprises the following steps: stirring and mixing to prepare a solution, coating the surface of a substrate with poor hydrophilicity with the solution, putting the substrate in the center of a tubular furnace, and preparing the two-dimensional material by adopting a chemical vapor deposition method. Compared with a traditional two-dimensional material substrate treatment method, the method has the advantages that the coating quality of a metal source inorganic matter solution on a poor-hydrophilicity substrate is effe