Vacuum coating process and coated workpiece

According to the vacuum coating process, a film layer is deposited on a workpiece to be coated through an atomic deposition technology, the workpiece to be coated is placed in a coating process chamber, and the film layer is deposited on the surface of the workpiece to be coated through multiple gro...

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Bibliographische Detailangaben
Hauptverfasser: YE CHANGXIN, CHEN ANYI, HUANG JUNKAI, ZHENG BOHONG, LIU ANHUI
Format: Patent
Sprache:chi ; eng
Schlagworte:
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Beschreibung
Zusammenfassung:According to the vacuum coating process, a film layer is deposited on a workpiece to be coated through an atomic deposition technology, the workpiece to be coated is placed in a coating process chamber, and the film layer is deposited on the surface of the workpiece to be coated through multiple growth cycles. Wherein the first growth cycle comprises the following steps: step S100: introducing an oxygen precursor which reacts with a workpiece to be coated into a coating process chamber under a plasma condition to obtain a first prefabricated part; s200, blowing gas is introduced into the coating process chamber; s300, an aluminum precursor reacting with the first prefabricated part is introduced into a coating process chamber, and a second prefabricated part is obtained; and S400, blowing gas is introduced into the coating process chamber. According to the vacuum coating process, the quality of a film layer can be improved. 本申请公开一种真空镀膜工艺以及镀膜工件,所述真空镀膜工艺利用原子沉积技术在待镀膜工件上沉积膜层,将待镀膜工件置于镀膜工艺室内,通过多次生长循环在待镀膜工件的表面沉积膜层,其