Method of forming pattern and method of manufacturing semiconductor memory device

A method of forming a pattern and a method of manufacturing a semiconductor memory device are provided. The method includes forming an etch target layer over a substrate including a first region and a second region; forming a hard mask structure over the etch target layer; forming a photoresist patt...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LEE DONG-HWAN, KIM SEOKHYUN, LEE WONUL, KIM KANG-UK
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ELECTRICITY
Online-Zugang:	Volltext bestellen
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