Photoetching plate pattern detection method, supporting device and detection system

The invention discloses a photoetching plate pattern detection method, a supporting device and a detection system. The photoetching plate pattern detection method comprises the following steps that S1, a comparison pattern layer is provided, the comparison pattern layer is provided with the outline...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: ZHU RUKANG, WANG YONGQIANG, HE RONG
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses a photoetching plate pattern detection method, a supporting device and a detection system. The photoetching plate pattern detection method comprises the following steps that S1, a comparison pattern layer is provided, the comparison pattern layer is provided with the outline of a standard photoetching plate, and a first datum point is marked on the comparison pattern layer; s2, acquiring a graph on the photoetching plate to generate a target graph layer, recording outline information of the target graph layer, and marking a second reference point on the target graph layer; and S3, overlapping the comparison layer with the target layer to enable the first reference point to coincide with the second reference point, calculating the distance between the contour edge of the comparison layer and the contour edge of the target layer, and comparing the distance with the standard tolerance to judge the damage rate of the pattern on the photoetching plate. According to the invention, the compar