Groove bottom fillet manufacturing method

The invention discloses a method for manufacturing a groove bottom fillet, which is characterized in that plasma is kept uninterrupted in the whole etching process of a groove, and the proportion of a first main etching gas and a second main etching gas in a fillet etching stage is changed in an inv...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: RUIHUAN WANG, LU CHENGBO, LU XIAOHAO, YU PENG
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses a method for manufacturing a groove bottom fillet, which is characterized in that plasma is kept uninterrupted in the whole etching process of a groove, and the proportion of a first main etching gas and a second main etching gas in a fillet etching stage is changed in an inverse proportion relation along with time. The bottom of the groove manufactured by the groove bottom fillet manufacturing method provided by the invention can obtain a bottom fillet contour with a relatively good appearance through observation, and the electrical property failure of a device caused by appearance such as double slop at the bottom of the groove or too flat bottom and sharp bottom corner is avoided. 本发明公开了一种沟槽底部圆角制作方法,在沟槽整个刻蚀过程中保持等离子体不中断,且圆角化刻蚀阶段第一主刻蚀气体和第二主刻蚀气体比例随时间呈现反比例关系变化。通过本发明所提供沟槽底部圆角制作方法制作的沟槽底部经观察能获得形貌较好的底部圆角轮廓,避免出现因沟槽底部double slop或底部太过平整及底部尖角等形貌,所导致的器件电性失效。