Ferroelectric capacitance behavior model construction method, system, equipment and product
The invention belongs to the technical field of semiconductor integrated circuit design, and aims to provide a ferroelectric capacitance behavior model construction method, system, equipment and product. The method comprises the following steps: acquiring test data; creating an initial ferroelectric...
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creator | ZHANG SHENG SHEN XINGXING HUANG ZHENGLE WANG RANRAN WU YICHENG |
description | The invention belongs to the technical field of semiconductor integrated circuit design, and aims to provide a ferroelectric capacitance behavior model construction method, system, equipment and product. The method comprises the following steps: acquiring test data; creating an initial ferroelectric capacitance behavior model by adopting a Verilog-A language, defining port types and electrical characteristic parameters of two ports of the initial ferroelectric capacitance behavior model, and defining initial model parameters of the initial ferroelectric capacitance behavior model; defining a ferroelectric capacitor element in a path between two ports of the initial ferroelectric capacitor behavior model, and assigning a preset behavior description formula to the ferroelectric capacitor element to obtain an initial ferroelectric capacitor behavior model; and creating a simulation netlist file matched with the initial ferroelectric capacitance behavior model, creating a sub-circuit, calling the initial ferroele |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN118446144A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN118446144A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN118446144A3</originalsourceid><addsrcrecordid>eNqNzbEKwjAURuEuDqK-w3WvQzGIqxSLk5ObQ4k3vzTQ5MbkVvDt7eADOJ3lg7Os7h1yFoxgzZ6JbbLs1UYGPTDYt5dMQRxGYolF88TqJVKADuJqKp-iCDXhNfkUEJVsdJSyuBmuq8XTjgWbX1fVtjvf2ssOSXqU-YQI7dtr0xyNOTTGnPb_mC_Ydjwv</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Ferroelectric capacitance behavior model construction method, system, equipment and product</title><source>esp@cenet</source><creator>ZHANG SHENG ; SHEN XINGXING ; HUANG ZHENGLE ; WANG RANRAN ; WU YICHENG</creator><creatorcontrib>ZHANG SHENG ; SHEN XINGXING ; HUANG ZHENGLE ; WANG RANRAN ; WU YICHENG</creatorcontrib><description>The invention belongs to the technical field of semiconductor integrated circuit design, and aims to provide a ferroelectric capacitance behavior model construction method, system, equipment and product. The method comprises the following steps: acquiring test data; creating an initial ferroelectric capacitance behavior model by adopting a Verilog-A language, defining port types and electrical characteristic parameters of two ports of the initial ferroelectric capacitance behavior model, and defining initial model parameters of the initial ferroelectric capacitance behavior model; defining a ferroelectric capacitor element in a path between two ports of the initial ferroelectric capacitor behavior model, and assigning a preset behavior description formula to the ferroelectric capacitor element to obtain an initial ferroelectric capacitor behavior model; and creating a simulation netlist file matched with the initial ferroelectric capacitance behavior model, creating a sub-circuit, calling the initial ferroele</description><language>chi ; eng</language><subject>CALCULATING ; COMPUTING ; COUNTING ; ELECTRIC DIGITAL DATA PROCESSING ; PHYSICS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240806&DB=EPODOC&CC=CN&NR=118446144A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240806&DB=EPODOC&CC=CN&NR=118446144A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ZHANG SHENG</creatorcontrib><creatorcontrib>SHEN XINGXING</creatorcontrib><creatorcontrib>HUANG ZHENGLE</creatorcontrib><creatorcontrib>WANG RANRAN</creatorcontrib><creatorcontrib>WU YICHENG</creatorcontrib><title>Ferroelectric capacitance behavior model construction method, system, equipment and product</title><description>The invention belongs to the technical field of semiconductor integrated circuit design, and aims to provide a ferroelectric capacitance behavior model construction method, system, equipment and product. The method comprises the following steps: acquiring test data; creating an initial ferroelectric capacitance behavior model by adopting a Verilog-A language, defining port types and electrical characteristic parameters of two ports of the initial ferroelectric capacitance behavior model, and defining initial model parameters of the initial ferroelectric capacitance behavior model; defining a ferroelectric capacitor element in a path between two ports of the initial ferroelectric capacitor behavior model, and assigning a preset behavior description formula to the ferroelectric capacitor element to obtain an initial ferroelectric capacitor behavior model; and creating a simulation netlist file matched with the initial ferroelectric capacitance behavior model, creating a sub-circuit, calling the initial ferroele</description><subject>CALCULATING</subject><subject>COMPUTING</subject><subject>COUNTING</subject><subject>ELECTRIC DIGITAL DATA PROCESSING</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNzbEKwjAURuEuDqK-w3WvQzGIqxSLk5ObQ4k3vzTQ5MbkVvDt7eADOJ3lg7Os7h1yFoxgzZ6JbbLs1UYGPTDYt5dMQRxGYolF88TqJVKADuJqKp-iCDXhNfkUEJVsdJSyuBmuq8XTjgWbX1fVtjvf2ssOSXqU-YQI7dtr0xyNOTTGnPb_mC_Ydjwv</recordid><startdate>20240806</startdate><enddate>20240806</enddate><creator>ZHANG SHENG</creator><creator>SHEN XINGXING</creator><creator>HUANG ZHENGLE</creator><creator>WANG RANRAN</creator><creator>WU YICHENG</creator><scope>EVB</scope></search><sort><creationdate>20240806</creationdate><title>Ferroelectric capacitance behavior model construction method, system, equipment and product</title><author>ZHANG SHENG ; SHEN XINGXING ; HUANG ZHENGLE ; WANG RANRAN ; WU YICHENG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN118446144A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>CALCULATING</topic><topic>COMPUTING</topic><topic>COUNTING</topic><topic>ELECTRIC DIGITAL DATA PROCESSING</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>ZHANG SHENG</creatorcontrib><creatorcontrib>SHEN XINGXING</creatorcontrib><creatorcontrib>HUANG ZHENGLE</creatorcontrib><creatorcontrib>WANG RANRAN</creatorcontrib><creatorcontrib>WU YICHENG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ZHANG SHENG</au><au>SHEN XINGXING</au><au>HUANG ZHENGLE</au><au>WANG RANRAN</au><au>WU YICHENG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Ferroelectric capacitance behavior model construction method, system, equipment and product</title><date>2024-08-06</date><risdate>2024</risdate><abstract>The invention belongs to the technical field of semiconductor integrated circuit design, and aims to provide a ferroelectric capacitance behavior model construction method, system, equipment and product. The method comprises the following steps: acquiring test data; creating an initial ferroelectric capacitance behavior model by adopting a Verilog-A language, defining port types and electrical characteristic parameters of two ports of the initial ferroelectric capacitance behavior model, and defining initial model parameters of the initial ferroelectric capacitance behavior model; defining a ferroelectric capacitor element in a path between two ports of the initial ferroelectric capacitor behavior model, and assigning a preset behavior description formula to the ferroelectric capacitor element to obtain an initial ferroelectric capacitor behavior model; and creating a simulation netlist file matched with the initial ferroelectric capacitance behavior model, creating a sub-circuit, calling the initial ferroele</abstract><oa>free_for_read</oa></addata></record> |
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subjects | CALCULATING COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING PHYSICS |
title | Ferroelectric capacitance behavior model construction method, system, equipment and product |
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