Beidou real-time millimeter-level deformation monitoring method and system

The invention discloses a Beidou real-time millimeter-level deformation monitoring method and system, and the method comprises the steps: obtaining the monitoring data of each monitoring station, obtaining an initial coordinate, carrying out the forward recursion of two continuous fixed star daily p...

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Hauptverfasser: ZHANG GUANJUN, CHEN XUSHENG, YANG YUNYANG, LIU CHEN, HU JINMIN, LI QUNKE, YANG HUAIZHI, HE YILEI, LIANG YONG, ZHU XINGSHENG, SUN BOWEN, HONG JIANGHUA, WEI HAO, ZHANG YUNLONG, YANG SEUNG-OH
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention discloses a Beidou real-time millimeter-level deformation monitoring method and system, and the method comprises the steps: obtaining the monitoring data of each monitoring station, obtaining an initial coordinate, carrying out the forward recursion of two continuous fixed star daily periods, and obtaining a monitoring station coordinate time sequence; calculating an accurate coordinate of each epoch, substituting the accurate coordinate into a double-difference observation model, calculating a double-difference residual error, and performing single-difference residual error reconstruction; constructing a matching window, performing accurate matching in a search window by using a cross correlation method, and correcting errors of a single-difference observation value; and substituting the corrected single-difference observation value into the double-difference observation equation again, and calculating the current epoch coordinate of the monitoring station. According to the method, the problem