PP resin copmosite used for metallic sputtered film, and the sputtered film therewith
A polypropylene resin composition for a film for metallization, which comprises 100 parts by weight of a polypropylene resin and 0.01 to 1 part by weight of a phosphite represented by the general formula (I): (wherein, R1, R2, R4 and R5 represent individually hydrogen, an alkyl, cycloalkyl, alkylcyc...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | A polypropylene resin composition for a film for metallization, which comprises 100 parts by weight of a polypropylene resin and 0.01 to 1 part by weight of a phosphite represented by the general formula (I): (wherein, R1, R2, R4 and R5 represent individually hydrogen, an alkyl, cycloalkyl, alkylcycloalkyl, aralkyl or phenyl; R3 represents hydrogen or an alkyl; X represents sulfur atom or a -CHR6- group (R6 represents hydrogen, an alkyl or cycloalkyl); n is 0 or 1; A is an alkylene or a *-CO(R7)m- group (R7is an alkylene, * mark is indicative of the bonding site of A to oxygen and m is 0 or 1); and either one of Y or Z is hydroxy, alkoxy or aralkyloxy and the other is hydrogen or an alkyl.), a film thereof, and a metallized film thereof. |
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