Method for magnetron sputtering of metal ruthenium on iron-nickel alloy composite material substrate

The invention discloses a method for magnetron sputtering of metal ruthenium on an iron-nickel alloy composite material substrate. According to the method, the metal ruthenium is deposited on the iron-nickel alloy composite material substrate for the first time, and accurate control over the thickness of the ruthenium layer is achieved by optimizing sputtering parameters such as the sputtering temperature, power, air pressure and time. The method can be used for sputtering the ruthenium layer metal with good bonding degree, high uniformity and easy thickness control, the process is simple, the sputtering process is short, the sputtering condition is easy to control, the sputtered ruthenium layer metal is good in compactness, high in purity and stable in performance, and the method has important significance in promoting application of an iron-nickel alloy composite material in the fields of catalysis and electronics. 本发明公开了一种在铁镍合金复合材料基底上磁控溅射金属钌的方法。本发明首次在铁镍合金复合材料基底上沉积金属钌，通过优化溅射参数，如溅射温度、功率、气压和时间等，实现对钌层厚度的精确控制。该