Stage apparatus for semiconductor inspection and lithographic systems

The embodiment of the invention relates to stage equipment for a semiconductor inspection and photoetching system. A semiconductor sample is received on a chuck of a stage movable relative to a stage frame. The stage, chuck, and sample are moved below an inspection or exposure head for inspecting or exposing the sample, and a plurality of two-dimensional encoder heads are coupled with the chuck. A plurality of two-dimensional encoder scales are coupled with a substrate through which the head is inserted, and a stage encoder is positioned on the stage frame. Movement of the stage, chuck, and sample is controlled based on the position detected by at least one of the two-dimensional encoder heads until a predetermined gap is reached that is not covered by the two-dimensional encoder scale. When such a predefined position within the gap is reached, movement control of the stage, chuck, and sample is switched to a position based on detection by the stage encoder. 本申请实施例涉及用于半导体检验和光刻系统的载台设备。在可相对于载台框架移动的载台的卡盘上接纳半导体样本