Method and device for producing at least one hollow structure, mirror, EUV lithography system, fluid supply device and method for supplying fluid

The invention relates to a method for producing a hollow structure (28) in a workpiece (25) in the form of a mirror substrate, in particular for an EUV mirror (M4), material removal processing with pulsed laser radiation (35), comprising: radiating pulsed laser radiation (35) from a radiation entry side (27) into the workpiece (25), which is formed from a material transparent to the pulsed laser radiation (35); focusing the pulsed laser radiation (35) to a focal point region (39); forming a removal advance (46) for two-dimensional removal of material of the workpiece (25) by moving the focal region (39) along the movement pattern (41); and producing a hollow structure (28) by moving the removal pres (46) in the workpiece (25), the removal pres (46) being formed at least intermittently during the production of the hollow structure (28) without the incident radiation direction (Z) of the pulsed laser radiation (35) vertically aligned at the radiation incident side (27) of the workpiece (25), and the hollow stru