System and method for high-flux nondestructive measurement of conductivity of thin film by using gold electrode
The invention relates to the technical field of thin film conductivity measurement, in particular to a system and method for high-flux nondestructive measurement of thin film conductivity through a gold electrode. Small conductive loss and good chemical corrosion resistance of gold are utilized, a g...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to the technical field of thin film conductivity measurement, in particular to a system and method for high-flux nondestructive measurement of thin film conductivity through a gold electrode. Small conductive loss and good chemical corrosion resistance of gold are utilized, a gold electrode plate is used as a basis, a constant current source is used for providing current, the voltage difference between multiple groups of gold electrodes directly connected with the thin film is measured through a gold probe to serve as voltage data, and the thin film resistivity is obtained by combining the geometric dimension of the thin film, so that high-throughput detection is realized; the measurement result can be read in real time, the operation is simple and easy, and the measurement efficiency is high; the gold probe is used for measuring the voltage difference between the gold electrodes, direct contact between the probe and the thin film to be measured is avoided, damage of the probe to a thin |
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