Electrorheological polishing device and method based on line electrode or group line electrode
The invention relates to an electrorheological polishing device and method based on a line electrode or a group line electrode. The electrorheological polishing device comprises a workpiece clamp, a machined workpiece, a workbench, a liquid tank, polishing liquid, the line electrode, an electrode ch...
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| creator | SONG TIANQI WANG ZHANSHAN WANG KUN AI HAIHONG |
| description | The invention relates to an electrorheological polishing device and method based on a line electrode or a group line electrode. The electrorheological polishing device comprises a workpiece clamp, a machined workpiece, a workbench, a liquid tank, polishing liquid, the line electrode, an electrode chuck and an alternating current power source. The liquid tank is connected with the workbench, polishing liquid is filled in the liquid tank, the workpiece clamp is fixedly installed on the workbench through the connecting piece and can be designed and replaced according to different shapes of workpieces, and it is guaranteed that the workpieces do not move during polishing. During polishing, the electrorheological effect is applied, the electrorheological fluid between the two line electrodes generates a chain structure in the electric field direction, the line electrodes clamped by the electrode chuck can move back and forth along a specified path, the solidified electrorheological fluid rubs the surface of a mach |
| format | Patent |
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The electrorheological polishing device comprises a workpiece clamp, a machined workpiece, a workbench, a liquid tank, polishing liquid, the line electrode, an electrode chuck and an alternating current power source. The liquid tank is connected with the workbench, polishing liquid is filled in the liquid tank, the workpiece clamp is fixedly installed on the workbench through the connecting piece and can be designed and replaced according to different shapes of workpieces, and it is guaranteed that the workpieces do not move during polishing. During polishing, the electrorheological effect is applied, the electrorheological fluid between the two line electrodes generates a chain structure in the electric field direction, the line electrodes clamped by the electrode chuck can move back and forth along a specified path, the solidified electrorheological fluid rubs the surface of a mach</description><language>chi ; eng</language><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; TRANSPORTING</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240723&DB=EPODOC&CC=CN&NR=118372093A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25568,76551</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240723&DB=EPODOC&CC=CN&NR=118372093A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SONG TIANQI</creatorcontrib><creatorcontrib>WANG ZHANSHAN</creatorcontrib><creatorcontrib>WANG KUN</creatorcontrib><creatorcontrib>AI HAIHONG</creatorcontrib><title>Electrorheological polishing device and method based on line electrode or group line electrode</title><description>The invention relates to an electrorheological polishing device and method based on a line electrode or a group line electrode. The electrorheological polishing device comprises a workpiece clamp, a machined workpiece, a workbench, a liquid tank, polishing liquid, the line electrode, an electrode chuck and an alternating current power source. The liquid tank is connected with the workbench, polishing liquid is filled in the liquid tank, the workpiece clamp is fixedly installed on the workbench through the connecting piece and can be designed and replaced according to different shapes of workpieces, and it is guaranteed that the workpieces do not move during polishing. During polishing, the electrorheological effect is applied, the electrorheological fluid between the two line electrodes generates a chain structure in the electric field direction, the line electrodes clamped by the electrode chuck can move back and forth along a specified path, the solidified electrorheological fluid rubs the surface of a mach</description><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNizEKAjEUBdNYiHqH7wEE1xRqKcuKlZW1S0yeSeCbH5Lo-S20srIaGGam6jowbCtSAoTFR2uYsnCsISZPDq9oQSY5eqAFcXQzFY4kEccEwmd2ICnkizzzj5-ryd1wxeLLmVoeh0t_WiHLiJqNRUIb-3PX7fR2s97rg_6neQNgQjy5</recordid><startdate>20240723</startdate><enddate>20240723</enddate><creator>SONG TIANQI</creator><creator>WANG ZHANSHAN</creator><creator>WANG KUN</creator><creator>AI HAIHONG</creator><scope>EVB</scope></search><sort><creationdate>20240723</creationdate><title>Electrorheological polishing device and method based on line electrode or group line electrode</title><author>SONG TIANQI ; WANG ZHANSHAN ; WANG KUN ; AI HAIHONG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN118372093A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>SONG TIANQI</creatorcontrib><creatorcontrib>WANG ZHANSHAN</creatorcontrib><creatorcontrib>WANG KUN</creatorcontrib><creatorcontrib>AI HAIHONG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SONG TIANQI</au><au>WANG ZHANSHAN</au><au>WANG KUN</au><au>AI HAIHONG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Electrorheological polishing device and method based on line electrode or group line electrode</title><date>2024-07-23</date><risdate>2024</risdate><abstract>The invention relates to an electrorheological polishing device and method based on a line electrode or a group line electrode. 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| language | chi ; eng |
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| subjects | DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING |
| title | Electrorheological polishing device and method based on line electrode or group line electrode |
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